ICMTD’07 – PRELIMINARY PROGRAM |
SESSION G : CHARGE TRAPPING |
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G-1
9h00
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Sub-lithographical Shrink of Twin FlashTM Memory Cells to the 32 nm Technology Node
M.F. Beug (Qimonda), R. Knoefler (Qimonda), C. Ludwig (Qimonda), R. Hagenbeck (Qimonda) , T. Müller (Qimonda), S. Riedel(Qimonda) , M. Isler (Qimonda) , (Qimonda) M. Strassburg , (Qimonda) T. Höhr (Qimonda), T. Mikolajick ( TU Bergakademie Freiberg ) , K.H. Küsters (Qimonda)
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G-2
9h20
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An embedded spacer-trapping memory in the CMOS technology
E. Pikhay (Tower), Y. Roizin (Tower), A. Fenigstein (Tower), A. Heiman (Tower), E. Aloni (Tower), G. Rosenman ( Tel Aviv University)
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G-3
9h40
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Comparison of DPT (Double Patterning Technology) vs. R (Reversal)-DPT using Off-set spacer for Bit-line contacts of 76nm pitch on NAND Flash cell
J.H. Park, B. Hwang, J. Shim, K. Lee, S. Kwon, S.Y. Park, D. Kwak, J. Park, K. Kim, K. Kim (Samsung)
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G-4
10h00
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Depletion 2-Transistor-SONOS Flash memories with zero gate voltage read out
N. Akil, M. van Duuren, D. Dormans, D. Boter, A. H. Miranda, D. Golubovic, R. van Schaijk, M. Slotboom (NXP Semiconductors)
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10h20 |
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Coffee break
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G-5
10h50 |
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Physical understanding and modeling of SANOS retention in
programmed state
A. Furnémont, M. Rosmeulen, A. Cacciato, L. Breuil, J. Van Houdt, K. De Meyer, H. Maes (IMEC)
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G-6
11h10 |
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The 40 nm TANOS(Si – Oxide - SiN – Al2O3 – TaN) Cell Technologies
for 32Gb NAND Flash Memory
B. Choi, Y. Park, J. Choi, C. Kang, C. Lee, Y. Shin, J. Kim, S. Jeon, J. Sel, J. Park, J. Sim, Y. Kim, S.k. Hwang (Samsung)
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G-7
11h30 |
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SONOS-type memory structures using thin silicon nitride films modified by low-energy Si+ implantation
P. Dimitrakis (NCRS), V. Ioannou-Sougleridis (NCRS), V. Em.Vamvakas (NCRS), P. Normand (NCRS), C. Bonafos ( CEMES-CNRS) S. Schamm ( CEMES-CNRS) , N. Cherkashin ( CEMES-CNRS) , G. Ben Assayag ( CEMES-CNRS) , M. Perego ( MDM CNR-INFM) , M. Fanciulli ( MDM CNR-INFM)
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G-8
11h50 |
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Effect of Al2O3 morphology on the erase saturation performance in SANOS-type memory cells
A. Cacciato , A. Furnémont, L. Breuil, J. De Vos, L. Haspeslagh, J. Van Houdt (IMEC) |
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